Trust 7111N Is Used In Exposure And Development Applications

T-7111N The resin is recommended specifically for the photosensitive development resist process, and the development will be clear and without residue. It can resist various strong acid etching liquids and weak alkaline corrosion. 100% solvent-free, suitable for printing and spraying processes. It dries quickly, surfaces quickly, and dries smoothly without sticking. It has excellent adhesion to all types of metals, glass, ceramics, and copper-clad laminates. After UV curing, the hardness, insulation, and etching resistance reach the optimal state before the etching process can be carried out. It is used for protective functions during metal marking, glass acid engraving, anodizing, circuit board etching, electroplating and other processing.