Product Overview
N-1466 is an advanced nanosilica sol featuring 10 nm spherical silica nanoparticles uniformly dispersed in an organic acrylate monomer matrix via a proprietary coupling process. Unlike irregular or aggregated silica, the spherical morphology and nanoscale dispersion provide ultra-high transparency (>98%), low coefficient of friction, enhanced hardness, and outstanding wear resistance.
With a high silica content (50 wt%), N-1466 significantly reduces volumetric shrinkage during UV curing, making it the preferred choice for precision applications such as optical thin films, high-clarity acrylic hard coatings, high-resolution 3D printing, and microelectronic adhesives where dimensional stability is critical.The product is supplied as a transparent liquid with a refractive index of 1.46 (matching most UV acrylic systems) and a moderately low viscosity of 1200 mPa·s at 25 °C, ensuring excellent processability in roll-to-roll, spray, and gravure coating lines.
Key Features & Benefits
| Feature | Benefit |
|---|---|
| Spherical 10 nm silica particles | Lower friction coefficient, smoother surface, higher abrasion resistance |
| 50 wt% nanosilica content | Maximizes hardness and thermal stability while minimizing shrinkage |
| >98% transparency | Perfect for optical films, anti-glare coatings, and clear hard coats |
| Refractive index 1.46 | Matches acrylic/methacrylate systems, eliminates haze |
| Low viscosity (1200 mPa·s) | Easy to apply by roller, gravure, slot-die, or spray |
| Acrylate monomer compatible | Directly integrates into UV-curable formulations without solvents |
| Reduced volume shrinkage | Prevents curling, warping, and cracking in thin films and 3D printed parts |
| Enhanced thermal stability | Improves heat resistance of the cured coating |
Applications
Optical Films & Hard Coatings
- Anti-scratch and anti-abrasion layers on PET, PC, or TAC films for displays, touch panels, and lenses.
- High-transparency protective coatings for acrylic (PMMA) surfaces.
- Low-refractive-index layers (nD 1.46) for anti-reflection stacks.
UV-Curable Coatings (Optical Nano-Coatings)
- Provides both hardness and flexibility with excellent adhesion.
- Resists yellowing and maintains clarity under UV exposure and elevated temperatures.
High-Precision 3D Printing
- Controls volumetric shrinkage in photopolymer resins, improving dimensional accuracy of fine features.
- Enhances green strength and reduces layer-line visibility.
Microelectronics Bonding & Encapsulation
- Low-shrinkage adhesive formulations for chip bonding, underfill, and sensor packaging.
- Low ionic purity (typical of silica sol) for reliable electronic applications.
UV Inks & Flexo Printing
- Minimizes film shrinkage on thin substrates (e.g., foil, film).
- Prevents edge curling and enables high-speed roll-to-roll printing without deformation.
- Low viscosity allows fine-line inkjet and screen printing.
Technical Specifications
| Property | Value |
|---|---|
| Appearance | Transparent liquid |
| Nanosilica content (wt%) | 50 |
| Monomer content (wt%) | 45–50 |
| Viscosity at 25 °C (mPa·s) | 1200 |
| Refractive index (nD²⁵) | 1.46 |
| Relative density | 1.45–1.55 |
| Nanoparticle size | 10 nm (spherical) |
| Matrix chemistry | Acrylate monomers (UV-reactive) |
| Transparency (coating) | >98% (visible range) |
Why Choose N-1466?
Most nanosilica dispersions compromise either transparency or shrinkage control. N-1466's spherical, mono-dispersed 10 nm particles avoid light scattering while packing efficiently to reduce cure-induced stress. The high silica loading (50%) is achieved without excessive viscosity thanks to the advanced coupling technology, enabling solvent-free, high-solid UV formulations.
Compared to fumed silica or irregular particle sols, N-1466 delivers:
- Smoother surface (lower COF)
- Higher scratch resistance (pencil hardness >2H on PC film)
- No haze or whitening even at thick film layers
- Minimal curl on thin substrates
Handling & Formulation Tips
- N-1466 is ready to be blended into UV-curable acrylate systems (monomers, oligomers, photoinitiators).
- Typical use level: 10–50 wt% of total resin solids depending on desired hardness and shrinkage control.
- Stir gently before use. Store in sealed, light-protected containers at 5–35 °C to avoid monomer polymerization.
- Compatible with most radical photoinitiators (e.g., TPO, 184, 819). Test compatibility with amine synergists if used.
Ordering & Support
Available in 1 kg, 20 kg, and 200 kg containers. Request a technical data sheet (TDS) or safety data sheet (SDS) for integration support. Contact our application engineers for custom optimization in your UV coating or 3D printing resin.
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